Dr. Burn J. Lin is the president at the College of Semiconductor Research, Taiwan Tsinghua University. He is also the Director of the NTHU-TSMC Joint Research Center. He was a Vice President and the Distinguished Fellow at TSMC 2011~2015 after joining in 2000 as Senior Director. He founded Linnovation, Inc. in 1991 and had held various technical and managerial positions at IBM since 1970. He has been extending the limit of optical lithography over half a century. Dr. Lin is a member of the US National Academy of Engineering, an Academician of Academia Sinica, Laureate of Industrial Technology Research Institute, IEEE Fellow, and SPIE Fellow. He has been elected as Distinguished Alumnus at Ohio State University where he received the MS and the PhD degrees; also a Distinguished Alumnus at National Taiwan University where his BS in Electrical Engineering was obtained.

Major awards:

This 2018 Future Science Award on Mathematics and Computer Science

2017 SPIE award on outstanding contribution to the lithography community

2013 IEEE Nishizawa metal in 2013

2009 IEEE Cledo Brunetti Award

2009 Benjamin G. Lamme Meritorious Achievement Medal

2006 Distinguished Optical Engineering Award

2004 1 st recipient of SPIE Frits Zernike award

2 TSMC Innovation Awards, 10 IBM Invention Awards, and IBM Outstanding Technical Contribution Award.

Dr. Lin published 2 books, 3 book chapters, 133 articles, and 88 US patents. He is the Founding Editor in Chief, Journal of Micro/nanolithography, MEMS, and MOEMS 2002~2011.